XPD and STM investigation of hexagonal boron nitride on Ni(111)

W. Auwärter, T. J. Kreutz, T. Greber, J. Osterwalder

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Abstract

Monolayers of hexagonal boron nitride have been grown by the reaction of benzene-like borazine (BN)3H6 with Ni(111) at 1050 K. The resulting layers are analyzed by means of Si Kα excited N 1s and B 1s X-ray photoelectron diffraction (XPD) and scanning tunneling microscopy (STM). STM shows large terraces without defects and resolves two different atomic species that are commensurate with Ni(111). From XPD it is found that the system discriminates fcc from hcp adsorption sites, that the h-BN layer is corrugated and that nitrogen terminates the surface. The B-N corrugation is determined quantitatively by R-factor analysis between single scattering cluster calculations and experiment. The results are discussed in connection with an existing LEED analysis on the same system [Y. Gamou, M. Terai, A. Nagashima, C. Oshima, Sci. Rep. RITU A 44 (1997) 211].

Original languageEnglish
Pages (from-to)229-236
Number of pages8
JournalSurface Science
Volume429
Issue number1
DOIs
StatePublished - 15 Jun 1999
Externally publishedYes

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