X-ray study of growing wetting films

P. Müller-Buschbaum, M. Strzelczyk, M. Tolan, W. Press

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

X-ray scattering experiments of liquid films on top of solid substrates were performed. With a short pulse disturbance, caused by a temperature difference between the substrate and the vapour in the X-ray cell, the wetting film thickness is reduced. Afterwards the time dependence of the growing film is monitored by X-ray reflectivity measurements in the region of total external reflection. We have examined CCl4- and CCl3Br-films on top of silicon wafers and CCl3Br on glass/gold and glass/silver substrates. The film thickness as function of time is explained by the Kolmogorov growth model. From the data we obtain rather long time constants and the dimension d=2 of the growing process

Original languageEnglish
Pages (from-to)89-95
Number of pages7
JournalZeitschrift für Physik B Condensed Matter
Volume98
Issue number1
DOIs
StatePublished - Mar 1995
Externally publishedYes

Keywords

  • 61.10
  • 68.10
  • 68.15

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