Abstract
The setup in the UHV box coater for the HADES RICH mirrors was modified to deposit VUV reflective layers on large area substrates. These substrates were made of 2 mm thick float glass with 87 cm spherical curvature and a perimeter of 86 cm. A good uniformity of the coatings could be obtained by a larger source-to-substrate distance of 155 cm. Impurity problems due to lower deposition rates had to be avoided with a better process vacuum. The modified setup, the thickness calibrations, uniformity tests, process conditions and reflectivity measurements are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 65-70 |
| Number of pages | 6 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment |
| Volume | 480 |
| Issue number | 1 |
| DOIs | |
| State | Published - 11 Mar 2002 |
| Event | 20th Wold Conference of the International Nuclear Target Development Society (INTDS 2000) - Antwerp, Belgium Duration: 2 Oct 2000 → 6 Oct 2000 |
Keywords
- Aluminum
- Electron beam evaporation
- Optical measurements
- RICH detectro
- Resistance heated source
- Thickness by quartz crystal monitor
- Titanium
- VUY reflectivity
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