Abstract
We present a systematic study of vertical transport in AlGaN/GaN heterostructures. The influence of barrier thickness and Al-concentration on the current across AlGaN barriers is investigated experimentally and compared to model calculations. The effect of polarization fields on the electronic properties of single- and double barrier heterostructures is discussed and experimental results are reviewed. AlN/GaN double barrier RTD structures are fabricated under optimized growth conditions. Experimental analysis of their electronic properties reveals indications for resonant tunneling in the low forward bias regime.
Original language | English |
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Pages (from-to) | 2210-2227 |
Number of pages | 18 |
Journal | Physica Status Solidi C: Conferences |
Volume | 1 |
Issue number | 8 |
DOIs | |
State | Published - 2004 |