TY - JOUR
T1 - UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents
AU - Miklos, David B.
AU - Hartl, Rebecca
AU - Michel, Philipp
AU - Linden, Karl G.
AU - Drewes, Jörg E.
AU - Hübner, Uwe
N1 - Publisher Copyright:
© 2018 Elsevier Ltd
PY - 2018/6/1
Y1 - 2018/6/1
N2 - This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10−3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10−4UV<10−3 cm2/mJ; like climbazole, tramadol, sotalol, citalopram, benzotriazole, venlafaxine and metoprolol), and most photo-resistant (kUV<10−4 cm2/mJ; like primidone, carbamazepine and gabapentin) compounds was 90%, 49% and 37% including outliers, respectively. The poorly reactive compound TCEP was not significantly eliminated during pilot-scale experiments. Additionally, based on removal kinetics of photo-resistant TOrCs, continuous pilot-scale operation revealed high variations of OH-radical exposure determined from removal kinetics of photo-resistant TOrCs, primarily due to nitrite concentration fluctuations in the feed water. Furthermore, a correlation between OH-radical exposure and scavenging capacity could be determined and verified by mechanistic modeling using UV fluence, H2O2 dosage, and standard water quality parameters (i.e., DOC, NO3−, NO2− and HCO3−) as model input data. This correlation revealed the possibility of OH-radical exposure prediction by water matrix parameters and proved its applicability for pilot-scale operations.
AB - This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10−3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10−4UV<10−3 cm2/mJ; like climbazole, tramadol, sotalol, citalopram, benzotriazole, venlafaxine and metoprolol), and most photo-resistant (kUV<10−4 cm2/mJ; like primidone, carbamazepine and gabapentin) compounds was 90%, 49% and 37% including outliers, respectively. The poorly reactive compound TCEP was not significantly eliminated during pilot-scale experiments. Additionally, based on removal kinetics of photo-resistant TOrCs, continuous pilot-scale operation revealed high variations of OH-radical exposure determined from removal kinetics of photo-resistant TOrCs, primarily due to nitrite concentration fluctuations in the feed water. Furthermore, a correlation between OH-radical exposure and scavenging capacity could be determined and verified by mechanistic modeling using UV fluence, H2O2 dosage, and standard water quality parameters (i.e., DOC, NO3−, NO2− and HCO3−) as model input data. This correlation revealed the possibility of OH-radical exposure prediction by water matrix parameters and proved its applicability for pilot-scale operations.
KW - Advanced oxidation
KW - Modeling
KW - OH-Radical exposure
KW - Pilot-scale operation
KW - Trace organic chemicals
KW - Wastewater treatment
UR - http://www.scopus.com/inward/record.url?scp=85042692484&partnerID=8YFLogxK
U2 - 10.1016/j.watres.2018.02.044
DO - 10.1016/j.watres.2018.02.044
M3 - Article
C2 - 29501761
AN - SCOPUS:85042692484
SN - 0043-1354
VL - 136
SP - 169
EP - 179
JO - Water Research
JF - Water Research
ER -