Underpotential Deposition of Lead on Copper(111): A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy

Gessie M. Brisard; Entissar Zenati; Hubert A. Gasteiger; Nenad M. Markovic; Philip N. Ross

doi:10.1021/la00006a060

Underpotential Deposition of Lead on Copper(111): A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy

Gessie M. Brisard, Entissar Zenati, Hubert A. Gasteiger, Nenad M. Markovic, Philip N. Ross

Research output: Contribution to journal › Article › peer-review

78 Scopus citations

Abstract

The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical results were found with both methods. Pb atoms are deposited underpotentially on Cu(lll) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(lll) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl- in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occuss and on the reversibility of the reaction.

Original language	English
Pages (from-to)	2221-2230
Number of pages	10
Journal	Langmuir
Volume	11
Issue number	6
DOIs	https://doi.org/10.1021/la00006a060
State	Published - 1 Jun 1995
Externally published	Yes

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title = "Underpotential Deposition of Lead on Copper(111): A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy",

abstract = "The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical results were found with both methods. Pb atoms are deposited underpotentially on Cu(lll) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(lll) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl- in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occuss and on the reversibility of the reaction.",

author = "Brisard, {Gessie M.} and Entissar Zenati and Gasteiger, {Hubert A.} and Markovic, {Nenad M.} and Ross, {Philip N.}",

year = "1995",

month = jun,

day = "1",

doi = "10.1021/la00006a060",

language = "English",

volume = "11",

pages = "2221--2230",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

number = "6",

}

Underpotential Deposition of Lead on Copper(111): A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy. / Brisard, Gessie M.; Zenati, Entissar; Gasteiger, Hubert A. et al.
In: Langmuir, Vol. 11, No. 6, 01.06.1995, p. 2221-2230.

Research output: Contribution to journal › Article › peer-review

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T1 - Underpotential Deposition of Lead on Copper(111)

T2 - A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy

AU - Brisard, Gessie M.

AU - Zenati, Entissar

AU - Gasteiger, Hubert A.

AU - Markovic, Nenad M.

AU - Ross, Philip N.

PY - 1995/6/1

Y1 - 1995/6/1

N2 - The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical results were found with both methods. Pb atoms are deposited underpotentially on Cu(lll) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(lll) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl- in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occuss and on the reversibility of the reaction.

AB - The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical results were found with both methods. Pb atoms are deposited underpotentially on Cu(lll) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(lll) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl- in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occuss and on the reversibility of the reaction.

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ER -

Underpotential Deposition of Lead on Copper(111): A Study Using a Single-Crystal Rotating Ring Disk Electrode and ex Situ Low-Energy Electron Difrraction and Auger Electron Spectroscopy

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