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Ultra-high vacuum compatible image furnace

  • A. Neubauer
  • , J. Buf
  • , A. Bauer
  • , B. Russ
  • , H. V. Lhneysen
  • , C. Pfleiderer

Research output: Contribution to journalArticlepeer-review

53 Scopus citations

Abstract

We report the design of an optical floating-zone furnace for single-crystal growth under ultra-high vacuum (UHV) compatible conditions. The system is based on a commercial image furnace, which has been refurbished to be all-metal sealed. Major changes concern the use of UHV rotary feedthroughs and bespoke quartz-metal seals with metal-O-rings at the lamp stage. As a consequence, the procedure of assembling the furnace for crystal growth is changed completely. Bespoke heating jackets permit to bake the system. For compounds with elevated vapor pressures, the ultra-high vacuum serves as a precondition for the use of a high-purity argon atmosphere up to 10bar. In the ferromagnetic Heusler compound Cu 2 MnAl, the improvements of purity result in an improved stability of the molten zone, grain selection, and, hence, single-crystal growth. Similar improvements are observed in traveling-solvent floating-zone growth of the antiferromagnetic Heusler compound Mn 3 Si. These improvements underscore the great potential of optical float-zoning for the growth of high-purity single crystals of intermetallic compounds.

Original languageEnglish
Article number013902
JournalReview of Scientific Instruments
Volume82
Issue number1
DOIs
StatePublished - Jan 2011

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