Ultra-fast domain formation in a semiconductor superlattice

R. Scheuerer, F. Klappenberger, K. F. Renk, E. Schomburg, J. Allen, G. R. Ramian, J. S.S. Scott, Kovsh, V. Ustinov, A. Zhukov

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Presents experimental evidence for ultra-fast domain formation in a semiconductor superlattice. An InGaAs/InAlAs superlattice device was mounted in a corner cube. The superlattice device showed a region of negative differential conductance in the current-voltage characteristic for voltages larger than an onset voltage. When the superlattice device was irradiated with radiation smaller than 1.2 THz, the onset voltage shifted, with increasing THz radiation power, to lower voltages. Taking an analysis based on a drift-diffusion model into account, we suggest that dipole domains form within about 400 fs.

Original languageEnglish
Title of host publicationConference Digest - 27th International Conference on Infrared and Millimeter Waves, IRMMW 2002
EditorsRichard J. Temkin
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages15-16
Number of pages2
ISBN (Electronic)0780374231, 9780780374232
DOIs
StatePublished - 2002
Externally publishedYes
Event27th International Conference on Infrared and Millimeter Waves, IRMMW 2002 - San Diego, United States
Duration: 22 Sep 200226 Sep 2002

Publication series

NameConference Digest - 27th International Conference on Infrared and Millimeter Waves, IRMMW 2002

Conference

Conference27th International Conference on Infrared and Millimeter Waves, IRMMW 2002
Country/TerritoryUnited States
CitySan Diego
Period22/09/0226/09/02

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