Triazidogallium and derivatives: New precursors to thin films and nanoparticles of GaN

R. A. Fischer, A. Miehr, E. Herdtweck, M. R. Mattner, O. Ambacher, T. Metzger, E. Born, S. Weinkauf, C. R. Pulham, S. Parsons

Research output: Contribution to journalArticlepeer-review

Abstract

The synthesis and properties of [Ga(N3)3], (1) and the related derivatives [(Do)(n)Ga(N3)3] (2a-d: Do = THF, NEt3, NMe3, quinuclidine, n = 1; 2e: Do = pyridine; n = 3), Li[(CH3)Ga(N3)3] (3), [(N3)2Ga{(CH2)3NMe2}] (4), [Cp(CO)2-Fe Ga(N3)2(py)] (5), and [(CO)4Co Ga(N3)2(NMe3)] (6) are reported. Compounds 2e and 4 were characterized by single-crystal X-ray diffraction. The deposition of polycrystalline GaN thin films from 2a-e by solution methods (spin-on pyrolysis) and the solid-state pyrolysis of 1 to give GaN nanoparticles life described.

Original languageEnglish
Pages (from-to)1353-1358
Number of pages6
JournalAngewandte Chemie International Edition in English
Volume35
Issue number21
StatePublished - 1996
Externally publishedYes

Keywords

  • azides
  • chemical vapor deposition
  • gallium compounds
  • materials science
  • thin films

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