Triazidogallium and derivatives: New precursors to thin films and nanoparticles of GaN

Roland A. Fischer, Alexander Miehr, Eberhardt Herdtweck, Michael R. Mattner, Oliver Ambacher, Thomas Metzger, Eberhard Born, Sevil Weinkauf, Colin R. Pulham, Simon Parsons

Research output: Contribution to journalArticlepeer-review

68 Scopus citations

Abstract

The synthesis and properties of [Ga(N3)3] (1) and the related derivatives [(Do)nGa(N 3)3] (2a-d: Do = THF, NEt3, NMe3, quinuclidine, n = 1; 2e: Do = pyridine; n = 3), Li[(CH3)Ga(N 3)3] (3), [(N3)2Ga{(CH 2)3NMe2}] (4), [Cp(CO)2-Fe-Ga(N 3)2(py)] (5), and [(CO)4Co-Ga(N 3)2(NMe3)] (6) are reported. Compounds 2e and 4 were characterized by single-crystal X-ray diffraction. The deposition of polycrystalline GaN thin films from 2a-e by solution methods (spin-on pyrolysis) and the solid-state pyrolysis of 1 to give GaN nanoparticles are described.

Original languageEnglish
Pages (from-to)1353-1358
Number of pages6
JournalChemistry - A European Journal
Volume2
Issue number11
DOIs
StatePublished - 1996

Keywords

  • Azides
  • Chemical vapor deposition
  • Gallium compounds
  • Materials science
  • Thin films

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