Total spectral radiant flux measurements on Xe excimer lamps from 115 nm to 1000 nm

Klaus E. Trampert, Mark Paravia, Rüdiger Daub, Wolfgang Heering

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Xe excimer lamps are used as VUV source for industrial application like surface cleaning. To determine the VUV efficiency of the lamp the radiant flux need to be known. Due to the difficulties of VUV measurements, it is often determined by interpolation from a value of a fixed angle, which results in large uncertainties. Here a goniometric setup is presented to measure the radiant flux of VUV sources like Xe excimer lamps which emit a narrow spectral band in the VUV range between X = 147 nm and 200 nm with a peak at 172 nm and spectral lines in NIR. By the use of two monochromators, we measure the spectral resolved radiant flux from 120 nm to 1000 nm. The measurement uncertainty of 9.7% is rather low for the VUV spectral range and depends mainly on the uncertainty of the used deuterium calibration standard from PTB (7%). Due to the strong temperature dependence of the transmission edge of silica used for the lamp vessel, the measurements are done in nitrogen atmosphere to ensure the convection cooling of the lamp. We measured the radiance distribution curve and radiant flux of Xe excimer lamps and could show the angle dependence of the spectrum. The measured correlation between the VUV band and the NIR lines gives us a better understanding of the plasma kinetics, which is used to optimize the pulsed excitation of the lamp.

Original languageEnglish
Title of host publicationOptical Measurement Systems for Industrial Inspection V
EditionPART 2
DOIs
StatePublished - 2007
Externally publishedYes
EventOptical Measurement Systems for Industrial Inspection V - Munich, Germany
Duration: 18 Jun 200722 Jun 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
NumberPART 2
Volume6616
ISSN (Print)0277-786X

Conference

ConferenceOptical Measurement Systems for Industrial Inspection V
Country/TerritoryGermany
CityMunich
Period18/06/0722/06/07

Keywords

  • NIR
  • Radiant flux
  • Spectroscopy
  • VUV
  • Xe excimer

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