Abstract
In this paper, a pilot plant is presented providing the treatment of low volume, high ionic strength wastewaters by advanced oxidation processes, such as UV/O3, UV/H2O2 and UV/O3H2O2. The plant is equipped with a bubble column to dissolve gaseous ozone and a special designed thin-film photoreactor, which enables the photoinitiated degradation of organic compounds of high optical density without any contact to the radiation source. The thin-film apparatus was applied to model solutions containing humic acid in order to remove the TOC in dependence on the operating conditions. In addition, a leachate of a waste landfill has been treated containing high concentrations of toxic compounds, e.g. chlorinated phenols, polyaromatic hydrocarbons, polychlorinated biphenyls and polychlorinated dibenzo-p-dioxins and dibenzo-p-furans. The application of UV/O3 has been proved to be an effective technique for the treatment of leachate resulting in degradation ratios of 100% for both phenols and hydrocarbons, 23-96% for biphenyls and at least 74% for dioxins and furans.
Original language | English |
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Pages (from-to) | 937-946 |
Number of pages | 10 |
Journal | Water Research |
Volume | 33 |
Issue number | 4 |
DOIs | |
State | Published - Mar 1999 |
Keywords
- AOP
- Advanced oxidation processes
- Leachate
- Photochemical degradation
- Seepage water
- Thin-film reactor
- UV/hydrogen peroxide
- UV/ozone
- Wet oxidation