Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

Keyphrases

• Thin Film Growth 100%
• Yttria-stabilized Zirconia 100%
• Aerosol-Assisted Chemical Vapor Deposition (AACVD) 100%
• Deposition Temperature 66%
• Nanocrystalline Microstructure 66%
• Stoichiometry 33%
• Film Composition 33%
• Surface Reaction 33%
• Film Growth 33%
• Temperature Regime 33%
• Grain Size 33%
• Metal Concentration 33%
• Randomly Oriented 33%
• Atmospheric Aerosol 33%
• Thin Film Microstructure 33%
• Metal Precursor 33%
• Diffusion Control 33%
• Diketonates 33%
• Separation Membrane 33%
• Controlled Thickness 33%
• Micro-tubular Solid Oxide Fuel Cell (MT-SOFC) 33%
• Amorphous-nanocrystalline 33%
• Columnar Microstructure 33%
• Gas Separating 33%
• Metal Solvent 33%
• Solid Oxide Fuel Cell Electrolytes 33%
• Yttria-stabilized Zirconia Thin Films 33%
• Amorphous Microstructure 33%

Material Science

• Chemical Vapor Deposition 100%
• Thin Film Growth 100%
• Yttria Stabilized Zirconia 100%
• Nanocrystalline 66%
• Grain Size 33%
• Surface Reaction 33%
• Film Growth 33%
• Oxide Compound 33%
• Thin Films 33%
• Suspended Particulate Matter 33%

Chemical Engineering

• Yttrium Oxide 100%
• Vapor Deposition 100%
• Chemical Vapor Deposition 100%
• Film 100%
• Atmospheric Aerosol 20%