Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

M. V.F. Schlupp; M. Prestat; J. Martynczuk; J. L.M. Rupp; A. Bieberle-Hütter; L. J. Gauckler

doi:10.1016/j.jpowsour.2011.11.016

Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

M. V.F. Schlupp, M. Prestat, J. Martynczuk, J. L.M. Rupp, A. Bieberle-Hütter, L. J. Gauckler

ETH Zurich

Research output: Contribution to journal › Article › peer-review

33 Scopus citations

Abstract

Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.

Original language	English
Pages (from-to)	47-55
Number of pages	9
Journal	Journal of Power Sources
Volume	202
DOIs	https://doi.org/10.1016/j.jpowsour.2011.11.016
State	Published - 15 Mar 2012
Externally published	Yes

Keywords

AA-CVD
Deposition mechanism
SOFC electrolyte
Thin film deposition
YSZ

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/j.jpowsour.2011.11.016

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title = "Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition",

abstract = "Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.",

keywords = "AA-CVD, Deposition mechanism, SOFC electrolyte, Thin film deposition, YSZ",

author = "Schlupp, {M. V.F.} and M. Prestat and J. Martynczuk and Rupp, {J. L.M.} and A. Bieberle-H{\"u}tter and Gauckler, {L. J.}",

note = "Funding Information: The authors warmly thank the Laboratory for Surface Science and Technology and the Electron Microscopy Center of ETH Z{\"u}rich (EMEZ) for support and the use of their XPS and TEM facilities, respectively. Financial support by the following institutions is gratefully acknowledged: Swiss National Science Foundation project CRSI22-126830, Center of Competence Energy and Mobility Switzerland (CCEM) , Swiss Electric Research (SER) , Competence Centre for Materials Science and Technology Switzerland (CCMX) , Korean-Swiss Science and Technology Cooperation .",

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doi = "10.1016/j.jpowsour.2011.11.016",

language = "English",

volume = "202",

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journal = "Journal of Power Sources",

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T1 - Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

AU - Schlupp, M. V.F.

AU - Prestat, M.

AU - Martynczuk, J.

AU - Rupp, J. L.M.

AU - Bieberle-Hütter, A.

AU - Gauckler, L. J.

N1 - Funding Information: The authors warmly thank the Laboratory for Surface Science and Technology and the Electron Microscopy Center of ETH Zürich (EMEZ) for support and the use of their XPS and TEM facilities, respectively. Financial support by the following institutions is gratefully acknowledged: Swiss National Science Foundation project CRSI22-126830, Center of Competence Energy and Mobility Switzerland (CCEM) , Swiss Electric Research (SER) , Competence Centre for Materials Science and Technology Switzerland (CCMX) , Korean-Swiss Science and Technology Cooperation .

PY - 2012/3/15

Y1 - 2012/3/15

N2 - Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.

AB - Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.

KW - AA-CVD

KW - Deposition mechanism

KW - SOFC electrolyte

KW - Thin film deposition

KW - YSZ

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DO - 10.1016/j.jpowsour.2011.11.016

M3 - Article

AN - SCOPUS:84855761074

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VL - 202

SP - 47

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JO - Journal of Power Sources

JF - Journal of Power Sources

ER -

Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

Abstract

Keywords

UN SDGs

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