The preparation of Cu/Al₂O₃ catalysts via CVD in a fluidized-bed reactor

Our ongoing study aims at the preparation of a copper catalyst of industrial interest via chemical vapor deposition of metal-organic precursors in a fluidized-bed reactor. In the present contribution, the preparation of Cu/Al₂O₃ model catalysts is reported. The used CVD precursors are Cu(II) dialkylamino-2-propoxides containing methyl and ethyl groups, respectively. The substrate used for deposition is a commercial alumina usually applied for chromatography. The samples are characterized using temperature-programmed reduction, reactive frontal chromatography using nitrous oxide, thermogravimetry, elemental analysis and X-ray diffraction. Although high copper loadings up to 10% can be achieved under the applied conditions, no free copper surface area can be found after reduction of catalyst samples.