The effect of chloride on the underpotential deposition of copper on Pt(111): AES, LEED, RRDE, and X-ray scattering studies

Nenad M. Marković; Hubert A. Gasteiger; Chris A. Lucas; Ian M. Tidswell; Philip N. Ross

doi:10.1016/0039-6028(95)00452-1

The effect of chloride on the underpotential deposition of copper on Pt(111): AES, LEED, RRDE, and X-ray scattering studies

Nenad M. Marković, Hubert A. Gasteiger, Chris A. Lucas, Ian M. Tidswell, Philip N. Ross

University of California at Berkeley

Research output: Contribution to journal › Article › peer-review

68 Scopus citations

Abstract

The details of the underpotential deposition (UPD) of Cu on Pt(111) in the presence of Cl^- were re-examined using a combination of familiar ex-situ techniques (AES/LEED and new in-situ techniques, anomalous surface X-ray scattering (SXS) and Cu²⁺ flux measurements using a rotating ring disk configuration with the Pt(111) single crystal as the disk electrode. In combination these techniques show definitively that Cu UPD occurs in a two step process, the first being the formation of a Cu{single bond}Cl adlattice having a bi-layer structure similar to the (111) plane of CuCl, the second being the formation of a pseudomorphic Cu monolayer covered with a Cl adlayer. The latter appears to have a structure similar to the structure of Cl adsorbed on Cu(111) to saturation in UHV.

Original language	English
Pages (from-to)	91-100
Number of pages	10
Journal	Surface Science
Volume	335
Issue number	C
DOIs	https://doi.org/10.1016/0039-6028(95)00452-1
State	Published - 20 Jul 1995
Externally published	Yes

Keywords

Adatoms
Adsorption kinetics
Auger electron spectroscopy
Bromine
Chemisorption
Chlorine
Copper
Electrochemical methods
Low energy electron diffraction (LEED)
Low index single crystal surfaces
Metal-electrolyte interfaces
Platinum
Solid-liquid interfaces
Surface structure roughness, Surface thermodynamics
X-ray scattering

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10.1016/0039-6028(95)00452-1

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@article{fd5a18828f554cdeb313180f1913623e,

title = "The effect of chloride on the underpotential deposition of copper on Pt(111): AES, LEED, RRDE, and X-ray scattering studies",

abstract = "The details of the underpotential deposition (UPD) of Cu on Pt(111) in the presence of Cl- were re-examined using a combination of familiar ex-situ techniques (AES/LEED and new in-situ techniques, anomalous surface X-ray scattering (SXS) and Cu2+ flux measurements using a rotating ring disk configuration with the Pt(111) single crystal as the disk electrode. In combination these techniques show definitively that Cu UPD occurs in a two step process, the first being the formation of a Cu{single bond}Cl adlattice having a bi-layer structure similar to the (111) plane of CuCl, the second being the formation of a pseudomorphic Cu monolayer covered with a Cl adlayer. The latter appears to have a structure similar to the structure of Cl adsorbed on Cu(111) to saturation in UHV.",

keywords = "Adatoms, Adsorption kinetics, Auger electron spectroscopy, Bromine, Chemisorption, Chlorine, Copper, Electrochemical methods, Low energy electron diffraction (LEED), Low index single crystal surfaces, Metal-electrolyte interfaces, Platinum, Solid-liquid interfaces, Surface structure roughness, Surface thermodynamics, X-ray scattering",

author = "Markovi{\'c}, {Nenad M.} and Gasteiger, {Hubert A.} and Lucas, {Chris A.} and Tidswell, {Ian M.} and Ross, {Philip N.}",

note = "Funding Information: We would like to thank Lee Johnson and Frank Zucca for their invaluable help in cutting and polishing the single crystals and in building many parts for the experimental set-up. Without their support most of this work would have been impossible. Also we would like to acknowledge the work of our summer student Andrew Martin who wrote the programs for the digital data acquisition. This work was supported by the Office of Energy Research, Office of Basic Energy Sciences, Division of Materials Sciences of the U.S. Department of Energy under Contract No. DE-AC03-76SF00098.",

year = "1995",

month = jul,

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doi = "10.1016/0039-6028(95)00452-1",

language = "English",

volume = "335",

pages = "91--100",

journal = "Surface Science",

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publisher = "Elsevier B.V.",

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T1 - The effect of chloride on the underpotential deposition of copper on Pt(111)

T2 - AES, LEED, RRDE, and X-ray scattering studies

AU - Marković, Nenad M.

AU - Gasteiger, Hubert A.

AU - Lucas, Chris A.

AU - Tidswell, Ian M.

AU - Ross, Philip N.

N1 - Funding Information: We would like to thank Lee Johnson and Frank Zucca for their invaluable help in cutting and polishing the single crystals and in building many parts for the experimental set-up. Without their support most of this work would have been impossible. Also we would like to acknowledge the work of our summer student Andrew Martin who wrote the programs for the digital data acquisition. This work was supported by the Office of Energy Research, Office of Basic Energy Sciences, Division of Materials Sciences of the U.S. Department of Energy under Contract No. DE-AC03-76SF00098.

PY - 1995/7/20

Y1 - 1995/7/20

N2 - The details of the underpotential deposition (UPD) of Cu on Pt(111) in the presence of Cl- were re-examined using a combination of familiar ex-situ techniques (AES/LEED and new in-situ techniques, anomalous surface X-ray scattering (SXS) and Cu2+ flux measurements using a rotating ring disk configuration with the Pt(111) single crystal as the disk electrode. In combination these techniques show definitively that Cu UPD occurs in a two step process, the first being the formation of a Cu{single bond}Cl adlattice having a bi-layer structure similar to the (111) plane of CuCl, the second being the formation of a pseudomorphic Cu monolayer covered with a Cl adlayer. The latter appears to have a structure similar to the structure of Cl adsorbed on Cu(111) to saturation in UHV.

AB - The details of the underpotential deposition (UPD) of Cu on Pt(111) in the presence of Cl- were re-examined using a combination of familiar ex-situ techniques (AES/LEED and new in-situ techniques, anomalous surface X-ray scattering (SXS) and Cu2+ flux measurements using a rotating ring disk configuration with the Pt(111) single crystal as the disk electrode. In combination these techniques show definitively that Cu UPD occurs in a two step process, the first being the formation of a Cu{single bond}Cl adlattice having a bi-layer structure similar to the (111) plane of CuCl, the second being the formation of a pseudomorphic Cu monolayer covered with a Cl adlayer. The latter appears to have a structure similar to the structure of Cl adsorbed on Cu(111) to saturation in UHV.

KW - Adatoms

KW - Adsorption kinetics

KW - Auger electron spectroscopy

KW - Bromine

KW - Chemisorption

KW - Chlorine

KW - Copper

KW - Electrochemical methods

KW - Low energy electron diffraction (LEED)

KW - Low index single crystal surfaces

KW - Metal-electrolyte interfaces

KW - Platinum

KW - Solid-liquid interfaces

KW - Surface structure roughness, Surface thermodynamics

KW - X-ray scattering

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U2 - 10.1016/0039-6028(95)00452-1

DO - 10.1016/0039-6028(95)00452-1

M3 - Article

AN - SCOPUS:0029341967

SN - 0039-6028

VL - 335

SP - 91

EP - 100

JO - Surface Science

JF - Surface Science

IS - C

ER -

The effect of chloride on the underpotential deposition of copper on Pt(111): AES, LEED, RRDE, and X-ray scattering studies

Abstract

Keywords

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