TY - GEN
T1 - Temperature-dependent study of 6H-SiC pin-diode reverse characteristics
AU - Lades, M.
AU - Schenk, A.
AU - Krumbein, U.
AU - Wachutka, G.
AU - Fichtner, W.
N1 - Publisher Copyright:
© 1996 IEEE.
PY - 1996
Y1 - 1996
N2 - Silicon carbide is a promising material for special semiconductor applications, such as high-power and high-temperature devices. To date, much effort has been devoted to improving the process and device technology. With the progress in this field, the need for accurate modeling of device characteristics arises. This implies the formulation of proper physical models and their validation. We report on investigations of the reverse characteristics of a 6H-SiC pin diode using the multi-dimensional device simulator DESSIS -ISE discussing the contributions of different physical mechanisms to the blocking behavior and their temperature dependence in the range of 300-623 K.
AB - Silicon carbide is a promising material for special semiconductor applications, such as high-power and high-temperature devices. To date, much effort has been devoted to improving the process and device technology. With the progress in this field, the need for accurate modeling of device characteristics arises. This implies the formulation of proper physical models and their validation. We report on investigations of the reverse characteristics of a 6H-SiC pin diode using the multi-dimensional device simulator DESSIS -ISE discussing the contributions of different physical mechanisms to the blocking behavior and their temperature dependence in the range of 300-623 K.
UR - https://www.scopus.com/pages/publications/17744363505
U2 - 10.1109/SISPAD.1996.865271
DO - 10.1109/SISPAD.1996.865271
M3 - Conference contribution
AN - SCOPUS:17744363505
T3 - International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
SP - 55
EP - 56
BT - 1996 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 1996
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 1996 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 1996
Y2 - 2 September 1996 through 4 September 1996
ER -