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Sub-20 nm short channel carbon nanotube transistors

  • R. V. Seidel
  • , A. P. Graham
  • , J. Kretz
  • , B. Rajasekharan
  • , G. S. Duesberg
  • , M. Liebau
  • , E. Unger
  • , F. Kreupl
  • , W. Hoenlein
  • Infineon Technologies AG

Research output: Contribution to journalArticlepeer-review

145 Scopus citations

Abstract

Carbon nanotube field-effect transistors with sub-20 nm long channels and on/off current ratios of >106 are demonstrated. Individual single-walled carbon nanotubes with diameters ranging from 0.7 to 1.1 nm grown from structured catalytic islands using chemical vapor deposition at 700°C form the channels. Electron beam lithography and a combination of HSQ, calixarene, and PMMA e-beam resists were used to structure the short channels and source and drain regions. The nanotube transistors display on-currents in excess of 15 μA for drain-source biases of only 0.4 V.

Original languageEnglish
Pages (from-to)147-150
Number of pages4
JournalNano Letters
Volume5
Issue number1
DOIs
StatePublished - Jan 2005
Externally publishedYes

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