Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium

C. Hertl, L. Koll, T. Schmitz, E. Werner, U. Gbureck

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Titanium substrates were coated with tantalum layers of 5 μm thickness using physical vapour deposition (PVD). The tantalum layers showed a (110)-preferred orientation. The coated samples were hardened by oxygen diffusion. Using X-ray diffraction the crystallographic structure of the tantalum coatings was characterised, comparing untreated and diffusion hardened specimen conditions. Oxygen depth profiles were determined by glow discharge spectrometry. The hardening effect of the heat treatment was examined by Vickers microhardness testing. The increase of surface hardness caused by oxygen diffusion was at least 50%.

Original languageEnglish
Pages (from-to)28-35
Number of pages8
JournalMaterials Science and Engineering C
Volume41
DOIs
StatePublished - 1 Aug 2014

Keywords

  • Diffusion
  • Magnetron sputtering
  • Metal surface treatment
  • Oxidation
  • Physical vapour deposition
  • Surface hardening
  • Titanium

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