Abstract
We report the observation of two-dimensional electron systems and enhanced mobilities in Si/Si0.5Ge0.5 strained-layer multilayer structures. The built-in strain is measured by phonon Raman spectroscopy. The mobility enhancement depends strongly on the position of the doped region within the layers. The experimental results can be explained in a consistent way when carrier confinement in the Si layer is assumed. The importance of the built-in strain in lowering the conduction band in Si is emphasized.
| Original language | English |
|---|---|
| Pages (from-to) | 2441-2444 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 54 |
| Issue number | 22 |
| DOIs | |
| State | Published - 1985 |
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