Abstract
The thermal transformation of deuterium in p-type crystalline silicon is studied with a variety of experimental techniques. It is found that D-atoms initially trapped at acceptor sites can be transferred by low temperature annealing to a different state tentatively ascribed to interstitial D2 molecules. Diffusion of D out of the passivated sample only occurs at temperatures significantly higher than this transformation temperature. This fact allows us to produce Si samples with extremely high deuterium concentrations (several at%) by a suitable passivation-annealing sequence. With increasing D-concentration, a number of characteristic Si-D defect complexes have been observed by vibrational spectroscopy.
Original language | English |
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Pages (from-to) | 240-244 |
Number of pages | 5 |
Journal | Physica B: Condensed Matter |
Volume | 170 |
Issue number | 1-4 |
DOIs | |
State | Published - Apr 1991 |