STAEBLER-WRONSKI EFFECT IN UNDOPED a-Si:H: - ITS INTRINSIC NATURE AND THE INFLUENCE OF IMPURITIES.

C. C. Tsai, M. Stutzmann, W. B. Jackson

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

27 Scopus citations

Abstract

By examining the purest material available to date, authors have shown that the Staebler-Wronski effect is an intrinsic property of a-Si:H. It appears that surface band bending can play an important role in the defect generation. Impurities can enhance the defect generation only when they exceed a crtical concentration of approximately 10**2**0 cm** minus **3 for oxygen and 10**1**9 cm** minus **3 for nitrogen, respectively. The observed enhancement probably originates from an 'alloying' effect, however, and a different mechanism related to impurities may be involved.

Original languageEnglish
Title of host publicationAIP Conference Proceedings
PublisherAIP
Pages242-249
Number of pages8
Edition120
ISBN (Print)0883183196, 9780883183199
DOIs
StatePublished - 1984
Externally publishedYes

Publication series

NameAIP Conference Proceedings
Number120
ISSN (Print)0094-243X

Fingerprint

Dive into the research topics of 'STAEBLER-WRONSKI EFFECT IN UNDOPED a-Si:H: - ITS INTRINSIC NATURE AND THE INFLUENCE OF IMPURITIES.'. Together they form a unique fingerprint.

Cite this