Abstract
Abstract Self-organization plays an imperative role in recent materials science. Highly tunable, periodic structures based on dynamic self-organization at micrometer scales have proven difficult to design, but are desired for the further development of micropatterning. In the present study, we report a microgroove array that spontaneously forms on a p-type silicon surface during its electrodissolution. Our detailed experimental results suggest that the instability can be classified as Turing instability. The characteristic scale of the Turing-type pattern is small compared to self-organized patterns caused by the Turing instabilities reported so far. The mechanism for the miniaturization of self-organized patterns is strongly related to the semiconducting property of silicon electrodes as well as the dynamics of their surface chemistry. Spontaneously getting a groove on: The spontaneous formation of a microscopic Turing-type pattern on a semiconductor electrode is reported. It is shown that the microscopic scale of the pattern is not determined by the ratio of activator and inhibitor, but by the reaction dynamics.
Original language | English |
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Pages (from-to) | 1613-1618 |
Number of pages | 6 |
Journal | ChemPhysChem |
Volume | 16 |
Issue number | 8 |
DOIs | |
State | Published - 1 Jun 2015 |
Keywords
- Turing pattern
- grooves
- self-organization
- semiconductors
- silicon