TY - GEN
T1 - Silicon Nanogap Electrode Engineering for Organic Monolayer Field Effect Transistors
AU - Pfaehler, Simon
AU - Pathak, Anshuma
AU - Liao, Kung Ching
AU - Schwartz, Jeffrey
AU - Tornow, Marc
N1 - Publisher Copyright:
© 2019 IEEE.
PY - 2019/7
Y1 - 2019/7
N2 - The fabrication and characterization of planar silicon nanogap electrode structures is described in which contact separation ≥ 30 nm was achieved. Starting from highly doped silicon-on-insulator substrates, fabrication is based on precise control of electron-beam lithography and subsequent reactive ion etching (etch rate 3.6 nm/s). A monolayer of an aromatic organophosphonate is then assembled in the etched nanogap. Conductance is greatly improved compared to a device absent the monolayer, and distinct field-effect induced modulation of the conductance is observed. Finite element simulations of the electrostatic potential distribution of the device structure supports its suitability as a three-terminal field effect device.
AB - The fabrication and characterization of planar silicon nanogap electrode structures is described in which contact separation ≥ 30 nm was achieved. Starting from highly doped silicon-on-insulator substrates, fabrication is based on precise control of electron-beam lithography and subsequent reactive ion etching (etch rate 3.6 nm/s). A monolayer of an aromatic organophosphonate is then assembled in the etched nanogap. Conductance is greatly improved compared to a device absent the monolayer, and distinct field-effect induced modulation of the conductance is observed. Finite element simulations of the electrostatic potential distribution of the device structure supports its suitability as a three-terminal field effect device.
UR - http://www.scopus.com/inward/record.url?scp=85081052580&partnerID=8YFLogxK
U2 - 10.1109/NANO46743.2019.8993870
DO - 10.1109/NANO46743.2019.8993870
M3 - Conference contribution
AN - SCOPUS:85081052580
T3 - Proceedings of the IEEE Conference on Nanotechnology
SP - 521
EP - 525
BT - 19th IEEE International Conference on Nanotechnology, NANO 2019
PB - IEEE Computer Society
T2 - 19th IEEE International Conference on Nanotechnology, NANO 2019
Y2 - 22 July 2019 through 26 July 2019
ER -