Silicon Nanocrystal Superlattice Nucleation and Growth

Adrien Guillaussier; Yixuan Yu; Vikas Reddy Voggu; Willi Aigner; Camila Saez Cabezas; Daniel W. Houck; Tushti Shah; Detlef M. Smilgies; Rui N. Pereira; Martin Stutzmann; Brian A. Korgel

doi:10.1021/acs.langmuir.7b02710

Silicon Nanocrystal Superlattice Nucleation and Growth

Adrien Guillaussier, Yixuan Yu, Vikas Reddy Voggu, Willi Aigner, Camila Saez Cabezas, Daniel W. Houck, Tushti Shah, Detlef M. Smilgies, Rui N. Pereira, Martin Stutzmann, Brian A. Korgel

TUM Emeriti of Excellence

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Colloidal dodecene-passivated silicon (Si) nanocrystals were dispersed in hexane or chloroform and deposited onto substrates as face-centered cubic superlattices by slowly evaporating the solvent. The uniformity of the nanocrystals enables extended order; however, the solvent and the evaporation protocol significantly influence the self-assembly process, determining the morphology of the films, the extent of order, and the superlattice orientation on the substrate. Chloroform yielded superlattices with step-flow growth morphologies and (111)_SL, (100)_SL, and (110)_SL orientations. Hexane led to mostly island morphologies when evaporated at room temperature with exclusively (111)_SL orientations. Higher evaporation temperatures led to more extensive step-flow deposition. A model for the surface diffusion of nanocrystals adsorbed on the superlattice surface is developed.

Original language	English
Pages (from-to)	13068-13076
Number of pages	9
Journal	Langmuir
Volume	33
Issue number	45
DOIs	https://doi.org/10.1021/acs.langmuir.7b02710
State	Published - 14 Nov 2017

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title = "Silicon Nanocrystal Superlattice Nucleation and Growth",

abstract = "Colloidal dodecene-passivated silicon (Si) nanocrystals were dispersed in hexane or chloroform and deposited onto substrates as face-centered cubic superlattices by slowly evaporating the solvent. The uniformity of the nanocrystals enables extended order; however, the solvent and the evaporation protocol significantly influence the self-assembly process, determining the morphology of the films, the extent of order, and the superlattice orientation on the substrate. Chloroform yielded superlattices with step-flow growth morphologies and (111)SL, (100)SL, and (110)SL orientations. Hexane led to mostly island morphologies when evaporated at room temperature with exclusively (111)SL orientations. Higher evaporation temperatures led to more extensive step-flow deposition. A model for the surface diffusion of nanocrystals adsorbed on the superlattice surface is developed.",

author = "Adrien Guillaussier and Yixuan Yu and Voggu, {Vikas Reddy} and Willi Aigner and Cabezas, {Camila Saez} and Houck, {Daniel W.} and Tushti Shah and Smilgies, {Detlef M.} and Pereira, {Rui N.} and Martin Stutzmann and Korgel, {Brian A.}",

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doi = "10.1021/acs.langmuir.7b02710",

language = "English",

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TY - JOUR

T1 - Silicon Nanocrystal Superlattice Nucleation and Growth

AU - Guillaussier, Adrien

AU - Yu, Yixuan

AU - Voggu, Vikas Reddy

AU - Aigner, Willi

AU - Cabezas, Camila Saez

AU - Houck, Daniel W.

AU - Shah, Tushti

AU - Smilgies, Detlef M.

AU - Pereira, Rui N.

AU - Stutzmann, Martin

AU - Korgel, Brian A.

PY - 2017/11/14

Y1 - 2017/11/14

N2 - Colloidal dodecene-passivated silicon (Si) nanocrystals were dispersed in hexane or chloroform and deposited onto substrates as face-centered cubic superlattices by slowly evaporating the solvent. The uniformity of the nanocrystals enables extended order; however, the solvent and the evaporation protocol significantly influence the self-assembly process, determining the morphology of the films, the extent of order, and the superlattice orientation on the substrate. Chloroform yielded superlattices with step-flow growth morphologies and (111)SL, (100)SL, and (110)SL orientations. Hexane led to mostly island morphologies when evaporated at room temperature with exclusively (111)SL orientations. Higher evaporation temperatures led to more extensive step-flow deposition. A model for the surface diffusion of nanocrystals adsorbed on the superlattice surface is developed.

AB - Colloidal dodecene-passivated silicon (Si) nanocrystals were dispersed in hexane or chloroform and deposited onto substrates as face-centered cubic superlattices by slowly evaporating the solvent. The uniformity of the nanocrystals enables extended order; however, the solvent and the evaporation protocol significantly influence the self-assembly process, determining the morphology of the films, the extent of order, and the superlattice orientation on the substrate. Chloroform yielded superlattices with step-flow growth morphologies and (111)SL, (100)SL, and (110)SL orientations. Hexane led to mostly island morphologies when evaporated at room temperature with exclusively (111)SL orientations. Higher evaporation temperatures led to more extensive step-flow deposition. A model for the surface diffusion of nanocrystals adsorbed on the superlattice surface is developed.

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VL - 33

SP - 13068

EP - 13076

JO - Langmuir

JF - Langmuir

IS - 45

ER -

Silicon Nanocrystal Superlattice Nucleation and Growth

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