Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor

Shinjita Acharya, Jan Torgersen, Yongmin Kim, Joonsuk Park, Peter Schindler, Anup L. Dadlani, Martin Winterkorn, Shicheng Xu, Stephen P. Walch, Takane Usui, Christian Schildknecht, Fritz B. Prinz

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Material Science

Chemical Engineering