Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

Stephan Hermes, Denise Zacher, Arne Baunemann, Christof Wöll, Roland A. Fischer

Research output: Contribution to journalArticlepeer-review

179 Scopus citations

Abstract

Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(η5-C5H 5)Pd(η3-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al 2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.

Original languageEnglish
Pages (from-to)2168-2173
Number of pages6
JournalChemistry of Materials
Volume19
Issue number9
DOIs
StatePublished - 1 May 2007
Externally publishedYes

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