Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

Stephan Hermes; Denise Zacher; Arne Baunemann; Christof Wöll; Roland A. Fischer

doi:10.1021/cm062854

Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

Stephan Hermes, Denise Zacher, Arne Baunemann, Christof Wöll, Roland A. Fischer

Max-Planck-lnstitut für Kohlenforschung

Research output: Contribution to journal › Article › peer-review

179 Scopus citations

Abstract

Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO₂, ALD-Al₂O₃ proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al₂O₃ substrates were demonstrated by MOCVD loading with [(η⁵-C₅H ₅)Pd(η³-C₃H₅)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al ₂O₃ as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.

Original language	English
Pages (from-to)	2168-2173
Number of pages	6
Journal	Chemistry of Materials
Volume	19
Issue number	9
DOIs	https://doi.org/10.1021/cm062854
State	Published - 1 May 2007
Externally published	Yes

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title = "Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers",

abstract = "Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(η5-C5H 5)Pd(η3-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al 2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.",

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T1 - Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

AU - Hermes, Stephan

AU - Zacher, Denise

AU - Baunemann, Arne

AU - Wöll, Christof

AU - Fischer, Roland A.

PY - 2007/5/1

Y1 - 2007/5/1

N2 - Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(η5-C5H 5)Pd(η3-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al 2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.

AB - Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(η5-C5H 5)Pd(η3-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al 2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.

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JO - Chemistry of Materials

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IS - 9

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Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

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