@article{3a63263031834e4b9bb0314249602799,
title = "Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications",
keywords = "block copolymer micelle nanolithography, glancing angle deposition, nanoimprint lithography, nanoparticle lithography, shadow growth physical vapor deposition",
author = "Jeong, \{Hyeon Ho\} and Mark, \{Andrew G.\} and Lee, \{Tung Chun\} and Kwanghyo Son and Wenwen Chen and Mariana Alarc{\'o}n-Correa and Insook Kim and Gisela Sch{\"u}tz and Peer Fischer",
year = "2015",
month = jul,
doi = "10.1002/advs.201500016",
language = "English",
volume = "2",
journal = "Advanced Science",
issn = "2198-3844",
publisher = "John Wiley and Sons Inc.",
number = "7",
}