Segregation in III-V semiconductor heterostructures studied by transmission electron microscopy

M. Schowalter, M. Melzer, A. Rosenauer, D. Gerthsen, R. Krebs, J. P. Reithmaier, A. Forchel, M. Arzberger, M. Bichler, G. Abstreitet, M. Grau, M. C. Amann, R. Sellin, D. Bimberg

Research output: Contribution to journalConference articlepeer-review

Abstract

Segregation is a kinetic growth effect causing intermixing of atoms at interfaces in semiconductor heterostructures. Quantitative measurements of segregation efficiencies with their dependence upon growth parameters and growth techniques are important to minimize segregation. Here we report on a variety of quantum well samples such as InGaAs/GaAs grown by molecular beam epitaxy and metal organic vapor phase epitaxy. The structures were analyzed by high-resolution transmission electron microscopy and composition profiles are determined on a near atomic scale. Applying the model of Muraki et al (1992), segregation efficiencies can be obtained on the basis of measured composition profiles.

Original languageEnglish
Pages (from-to)127-130
Number of pages4
JournalDesign and Nature
Volume6
StatePublished - 2004
EventDesign and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece
Duration: 28 Jun 200430 Jun 2004

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