Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

A. Schulz; P. Büchele; E. Ramisch; O. Janzen; F. Jimenez; C. Kamm; J. Kopecki; M. Leins; S. Merli; H. Petto; F. R. Mendez; J. Schneider; U. Schumacher; M. Walker; U. Stroth

doi:10.1002/ctpp.201210057

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

A. Schulz
, P. Büchele
, E. Ramisch
, O. Janzen
, F. Jimenez
, C. Kamm
, J. Kopecki
, M. Leins
, S. Merli
, H. Petto
, F. R. Mendez
, J. Schneider
, U. Schumacher
, M. Walker
, U. Stroth

Universität Stuttgart

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (10³-10⁴ Pa) up to atmospheric pressure (10⁵ Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

Original language	English
Pages (from-to)	607-614
Number of pages	8
Journal	Contributions to Plasma Physics
Volume	52
Issue number	7
DOIs	https://doi.org/10.1002/ctpp.201210057
State	Published - Aug 2012
Externally published	Yes

Keywords

Duo-Plasmaline
ECR plasma
Microwave plasma
Plasma torch

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10.1002/ctpp.201210057

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title = "Scalable Microwave Plasma Sources From Low to Atmospheric Pressure",

abstract = "There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.",

keywords = "Duo-Plasmaline, ECR plasma, Microwave plasma, Plasma torch",

author = "A. Schulz and P. B{\"u}chele and E. Ramisch and O. Janzen and F. Jimenez and C. Kamm and J. Kopecki and M. Leins and S. Merli and H. Petto and Mendez, \{F. R.\} and J. Schneider and U. Schumacher and M. Walker and U. Stroth",

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doi = "10.1002/ctpp.201210057",

language = "English",

volume = "52",

pages = "607--614",

journal = "Contributions to Plasma Physics",

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T1 - Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

AU - Schulz, A.

AU - Büchele, P.

AU - Ramisch, E.

AU - Janzen, O.

AU - Jimenez, F.

AU - Kamm, C.

AU - Kopecki, J.

AU - Leins, M.

AU - Merli, S.

AU - Petto, H.

AU - Mendez, F. R.

AU - Schneider, J.

AU - Schumacher, U.

AU - Walker, M.

AU - Stroth, U.

PY - 2012/8

Y1 - 2012/8

N2 - There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

AB - There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

KW - Duo-Plasmaline

KW - ECR plasma

KW - Microwave plasma

KW - Plasma torch

UR - https://www.scopus.com/pages/publications/84865302752

U2 - 10.1002/ctpp.201210057

DO - 10.1002/ctpp.201210057

M3 - Article

AN - SCOPUS:84865302752

SN - 0863-1042

VL - 52

SP - 607

EP - 614

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 7

ER -

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

Abstract

Keywords

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