Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

A. Schulz; P. Büchele; E. Ramisch; O. Janzen; F. Jimenez; C. Kamm; J. Kopecki; M. Leins; S. Merli; H. Petto; F. R. Mendez; J. Schneider; U. Schumacher; M. Walker; U. Stroth

doi:10.1002/ctpp.201210057

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

A. Schulz, P. Büchele, E. Ramisch, O. Janzen, F. Jimenez, C. Kamm, J. Kopecki, M. Leins, S. Merli, H. Petto, F. R. Mendez, J. Schneider, U. Schumacher, M. Walker, U. Stroth

Universität Stuttgart

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (10³-10⁴ Pa) up to atmospheric pressure (10⁵ Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

Original language	English
Pages (from-to)	607-614
Number of pages	8
Journal	Contributions to Plasma Physics
Volume	52
Issue number	7
DOIs	https://doi.org/10.1002/ctpp.201210057
State	Published - Aug 2012
Externally published	Yes

Keywords

Duo-Plasmaline
ECR plasma
Microwave plasma
Plasma torch

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10.1002/ctpp.201210057

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title = "Scalable Microwave Plasma Sources From Low to Atmospheric Pressure",

abstract = "There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.",

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T1 - Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

AU - Schulz, A.

AU - Büchele, P.

AU - Ramisch, E.

AU - Janzen, O.

AU - Jimenez, F.

AU - Kamm, C.

AU - Kopecki, J.

AU - Leins, M.

AU - Merli, S.

AU - Petto, H.

AU - Mendez, F. R.

AU - Schneider, J.

AU - Schumacher, U.

AU - Walker, M.

AU - Stroth, U.

PY - 2012/8

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N2 - There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

AB - There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (103-104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them.

KW - Duo-Plasmaline

KW - ECR plasma

KW - Microwave plasma

KW - Plasma torch

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DO - 10.1002/ctpp.201210057

M3 - Article

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VL - 52

SP - 607

EP - 614

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 7

ER -

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

Abstract

Keywords

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