Saturation measurements of electrically detected magnetic resonance in hydrogenated amorphous silicon based thin-film transistors

Genshiro Kawachi, Carlos F.O. Graeff, Martin S. Brandt, Martin Stutzmann

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

The saturational broadening of an electrically detected magnetic resonance signal in hydrogenated amorphous silicon has been observed in thin-film transistor structures. It was found that broadening of the resonance spectrum with increasing microwave power is caused by an enhanced local microwave field in the transistor due to strong coupling of th microwave field with the microstrip-like structure of the transistor. The field enhancement factor, which was estimated from saturation measurements, can reach 33 in a transistor with a channel width-to-length ratio of 500/10, demonstrating that the thin-film resonator is an effective tool for improving the detection sensitivity.

Original languageEnglish
Pages (from-to)121-125
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume36
Issue number1 A
DOIs
StatePublished - Jan 1997

Keywords

  • Electrically detected magnetic resonance
  • Hydrogenated amorphous silicon
  • Microstrip resonator
  • Thin-film transistors
  • a-Si:H TFTs

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