Revealing the Bonding Environment of Zn in ALD Zn(O,S) Buffer Layers through X-ray Absorption Spectroscopy

Anup Dadlani, Shinjita Acharya, Orlando Trejo, Dennis Nordlund, Mirco Peron, Javad Razavi, Filippo Berto, Fritz B. Prinz, Jan Torgersen

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

Zn(O,S) buffer layer electronic configuration is determined by its composition and thickness, tunable through atomic layer deposition. The Zn K and L-edges in the X-ray absorption near edge structure verify ionicity and covalency changes with S content. A high intensity shoulder in the Zn K-edge indicates strong Zn 4s hybridized states and a preferred c-axis orientation. 2-3 nm thick films with low S content show a subdued shoulder showing less contribution from Zn 4s hybridization. A lower energy shift with film thickness suggests a decreasing bandgap. Further, ZnSO4 forms at substrate interfaces, which may be detrimental for device performance.

Original languageEnglish
Pages (from-to)39105-39109
Number of pages5
JournalACS Applied Materials and Interfaces
Volume9
Issue number45
DOIs
StatePublished - 15 Nov 2017
Externally publishedYes

Keywords

  • X-ray absorption near edge structure (XANES)
  • Zn(O,S)
  • atomic layer deposition (ALD)
  • buffer layers
  • oxysulfide films

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