Abstract
Zn(O,S) buffer layer electronic configuration is determined by its composition and thickness, tunable through atomic layer deposition. The Zn K and L-edges in the X-ray absorption near edge structure verify ionicity and covalency changes with S content. A high intensity shoulder in the Zn K-edge indicates strong Zn 4s hybridized states and a preferred c-axis orientation. 2-3 nm thick films with low S content show a subdued shoulder showing less contribution from Zn 4s hybridization. A lower energy shift with film thickness suggests a decreasing bandgap. Further, ZnSO4 forms at substrate interfaces, which may be detrimental for device performance.
Original language | English |
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Pages (from-to) | 39105-39109 |
Number of pages | 5 |
Journal | ACS Applied Materials and Interfaces |
Volume | 9 |
Issue number | 45 |
DOIs | |
State | Published - 15 Nov 2017 |
Externally published | Yes |
Keywords
- X-ray absorption near edge structure (XANES)
- Zn(O,S)
- atomic layer deposition (ALD)
- buffer layers
- oxysulfide films