Skip to main navigation Skip to search Skip to main content

Remote-doping scattering and the local field corrections in the 2D electron system in a modulation-doped Si/SiGe quantum well

  • V. T. Dolgopolov
  • , E. V. Deviatov
  • , A. A. Shashkin
  • , U. Wieser
  • , U. Kunze
  • , G. Abstreiter
  • , K. Brunner

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

The small, about 30% magnetoresistance at the onset of full spin polarization in the 2D electron system in a modulation-doped Si/SiGe quantum well gives evidence that it is the remote doping that determines the transport scattering time. Measurements of the mobility in this strongly-interacting electron system with remote-doping scattering allow us to arrive at a conclusion that the Hubbard form underestimates the local field corrections by about a factor of 2.

Original languageEnglish
Pages (from-to)271-278
Number of pages8
JournalSuperlattices and Microstructures
Volume33
Issue number5-6
DOIs
StatePublished - 2003

Fingerprint

Dive into the research topics of 'Remote-doping scattering and the local field corrections in the 2D electron system in a modulation-doped Si/SiGe quantum well'. Together they form a unique fingerprint.

Cite this