Refined analytical model of combined thermionic emission and drift-diffusion current flow through schottky structure

J. Racko, D. Donoval, G. Wachutka

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

A refined approach leading to an enhanced analytical model of current transport through a Schottky structure at high forward bias voltage is presented The derived analytical equations represent a reasonable compromise between the physical rigorosity and practical applicability of two real metal-semiconductor interfaces including the quasi-neutral layer in one compact model.

Original languageEnglish
Title of host publicationESSDERC 1996 - Proceedings of the 26th European Solid State Device Research Conference
EditorsMassimo Rudan, Giorgio Baccarani
PublisherIEEE Computer Society
Pages275-278
Number of pages4
ISBN (Electronic)286332196X
ISBN (Print)9782863321966
StatePublished - 1996
Event26th European Solid State Device Research Conference, ESSDERC 1996 - Bologna, Italy
Duration: 9 Sep 199611 Sep 1996

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference26th European Solid State Device Research Conference, ESSDERC 1996
Country/TerritoryItaly
CityBologna
Period9/09/9611/09/96

Fingerprint

Dive into the research topics of 'Refined analytical model of combined thermionic emission and drift-diffusion current flow through schottky structure'. Together they form a unique fingerprint.

Cite this