@inproceedings{d067819275e347768219331adedad03b,
title = "Recent advances in use of atomic layer deposition and focused ion beams for fabrication of fresnel zone plates for hard X-rays",
abstract = "Developments and advances in the e-beam lithography (EBL) made it possible to reach resolutions in a single digit nanometer range in the soft x-ray microscopy using Fresnel Zone Plates (FZP). However, it is very difficult to fabricate efficient FZPs for hard x-rays via this conventional fabrication technique due to limitations in the achievable aspect ratios. Here, we demonstrate the use of alternative fabrication techniques that depend on utilization of atomic layer deposition and focused ion beam processing to deliver FZPs that are efficient for the hard X-ray range.",
keywords = "ALD, Atomic layer deposition, FIB, Focused ion beam, Fresnel zone plate, FZP, Microscopy, Multilayer, Resolution, Synchrotron radiation, X-ray optics",
author = "Kahraman Keskinbora and Robisch, {Anna Lena} and Marcel Mayer and Corinne Gr{\'e}vent and Szeghalmi, {Adriana V.} and Mato Knez and Markus Weigand and Irina Snigireva and Anatoly Snigirev and Tim Salditt and Gisela Sch{\"u}tz",
year = "2013",
doi = "10.1117/12.2027251",
language = "English",
isbn = "9780819497017",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
booktitle = "X-Ray Nanoimaging",
note = "X-Ray Nanoimaging: Instruments and Methods ; Conference date: 28-08-2013 Through 29-08-2013",
}