Properties and applications of MBE grown AlGaN

M. Stutzmann, O. Ambacher, A. Cros, M. S. Brandt, H. Angerer, R. Dimitrov, N. Reinacher, T. Metzger, R. Höpler, D. Brunner, F. Freudenberg, R. Handschuh, Ch Deger

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

AlGaN epitaxial films have been grown on sapphire by plasma-induced molecular beam epitaxy (MBE) over the entire composition range from GaN to AlN. Structural and optical properties of the alloys have been investigated by X-ray diffraction (XRD), transmission electron and atomic force microscopy, Raman scattering, ellipsometry, optical transmission, and subgap absorption spectroscopy. Electron spin resonance has been used to study the dependence of intrinsic paramagnetic defects on Al mole fraction. N- and p-type doping with Si and Mg, respectively is found to become increasingly difficult with increasing Al content because of a continuous shift of the donor and acceptor levels deeper into the bandgap. Apart from the use of AlGaN as cladding layers in light emitting diodes, applications in MODFET transistors, solar blind photodetectors, surface acoustic wave devices and Bragg reflectors appear interesting and will be discussed briefly.

Original languageEnglish
Pages (from-to)212-218
Number of pages7
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume50
Issue number1-3
DOIs
StatePublished - 18 Dec 1997

Keywords

  • AlGaN
  • Molecular beam epitaxy
  • Properties

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