Probing the Spatial Homogeneity of Exfoliated HfTe5 Films

Maanwinder P. Singh, Qingxin Dong, Gen Fu Chen, Alexander W. Holleitner, Christoph Kastl

Research output: Contribution to journalArticlepeer-review

Abstract

In van der Waals materials, external strain is an effective tool to manipulate and control electronic responses by changing the electronic bands upon lattice deformation. In particular, the band gap of the layered transition metal pentatelluride HfTe5 is sufficiently small to be inverted by subtle changes of the lattice parameters resulting in a strain-tunable topological phase transition. In that case, knowledge about the spatial homogeneity of electronic properties becomes crucial, especially for the microfabricated thin film circuits used in typical transport measurements. Here, we reveal the homogeneity of exfoliated HfTe5 thin films by spatially resolved Raman microscopy. Comparing the Raman spectra under applied external strain to unstrained bulk references, we pinpoint local variations of Raman signatures to inhomogeneous strain profiles in the sample. Importantly, our results demonstrate that microfabricated contacts can act as sources of significant inhomogeneities. To mitigate the impact of unintentional strain and its corresponding modifications of the electronic structure, careful Raman microscopy constitutes a valuable tool for quantifying the homogeneity of HfTe5 films and circuits fabricated thereof.

Original languageEnglish
Pages (from-to)18327-18333
Number of pages7
JournalACS Nano
Volume18
Issue number28
DOIs
StatePublished - 16 Jul 2024

Keywords

  • Raman microscopy
  • disorder
  • strain
  • topological insulator
  • van der Waals materials

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