Abstract
Plasma processing represents an attractive and versatile option for the fabrication of low-dimensional nanomaterials, whose chemical and physical properties can be conveniently tailored for the development of advanced technologies. In particular, Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) is an appealing route to multi-functional oxide nanoarchitectures under relatively mild conditions, owing to the unique features and activation mechanisms of non-equilibrium plasmas. In this context, the potential of plasma-assisted fabrication in advanced nanosystem development is discussed. After a brief introduction on the basic categories of plasma approaches, the perspectives of application to CVD processes are commented, reporting on the growth and characterization of Co 3O 4 nanomaterials as a case study. Besides examining the interrelations between the material properties and the synthesis conditions, special focus is given to their emerging applications as catalysts for photo-assisted hydrogen production and solid state gas sensors.
Original language | English |
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Pages (from-to) | 8206-8213 |
Number of pages | 8 |
Journal | Journal of Nanoscience and Nanotechnology |
Volume | 11 |
Issue number | 9 |
DOIs | |
State | Published - Sep 2011 |
Externally published | Yes |
Keywords
- Co O nanomaterials
- Gas sensing
- Hydrogen photo-production
- PE-CVD
- Plasma processing