Plasma processing of nanomaterials: Emerging technologies for sensing and energy applications

Alberto Gasparotto, Davide Barreca, Daniela Bekermann, Anjana Devi, Roland A. Fischer, Chiara MacCato, Eugenio Tondello

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

Plasma processing represents an attractive and versatile option for the fabrication of low-dimensional nanomaterials, whose chemical and physical properties can be conveniently tailored for the development of advanced technologies. In particular, Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) is an appealing route to multi-functional oxide nanoarchitectures under relatively mild conditions, owing to the unique features and activation mechanisms of non-equilibrium plasmas. In this context, the potential of plasma-assisted fabrication in advanced nanosystem development is discussed. After a brief introduction on the basic categories of plasma approaches, the perspectives of application to CVD processes are commented, reporting on the growth and characterization of Co 3O 4 nanomaterials as a case study. Besides examining the interrelations between the material properties and the synthesis conditions, special focus is given to their emerging applications as catalysts for photo-assisted hydrogen production and solid state gas sensors.

Original languageEnglish
Pages (from-to)8206-8213
Number of pages8
JournalJournal of Nanoscience and Nanotechnology
Volume11
Issue number9
DOIs
StatePublished - Sep 2011
Externally publishedYes

Keywords

  • Co O nanomaterials
  • Gas sensing
  • Hydrogen photo-production
  • PE-CVD
  • Plasma processing

Fingerprint

Dive into the research topics of 'Plasma processing of nanomaterials: Emerging technologies for sensing and energy applications'. Together they form a unique fingerprint.

Cite this