Plasma enhanced chemical vapor deposition of vanadium carbide VC1−x and VOx from vanadocene Cp2V

Lutz Deutschmann; Johannes Messelhäuser; Harald Suhr; Wolfgang A. Herrmann; Peter Härter

doi:10.1002/adma.19940060512

Plasma enhanced chemical vapor deposition of vanadium carbide VC_1−x and VO_x from vanadocene Cp₂V

Lutz Deutschmann
, Johannes Messelhäuser
, Harald Suhr
, Wolfgang A. Herrmann
, Peter Härter

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC_1–x), storage media (VO₂), and smart electrochromic windows (V₂O₅), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.

Original language	English
Pages (from-to)	392-395
Number of pages	4
Journal	Advanced Materials
Volume	6
Issue number	5
DOIs	https://doi.org/10.1002/adma.19940060512
State	Published - May 1994
Externally published	Yes

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title = "Plasma enhanced chemical vapor deposition of vanadium carbide VC1−x and VOx from vanadocene Cp2V",

abstract = "Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.",

author = "Lutz Deutschmann and Johannes Messelh{\"a}user and Harald Suhr and Herrmann, \{Wolfgang A.\} and Peter H{\"a}rter",

year = "1994",

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language = "English",

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pages = "392--395",

journal = "Advanced Materials",

issn = "0935-9648",

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T1 - Plasma enhanced chemical vapor deposition of vanadium carbide VC1−x and VOx from vanadocene Cp2V

AU - Deutschmann, Lutz

AU - Messelhäuser, Johannes

AU - Suhr, Harald

AU - Herrmann, Wolfgang A.

AU - Härter, Peter

PY - 1994/5

Y1 - 1994/5

N2 - Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.

AB - Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.

UR - https://www.scopus.com/pages/publications/0028424386

U2 - 10.1002/adma.19940060512

DO - 10.1002/adma.19940060512

M3 - Article

AN - SCOPUS:0028424386

SN - 0935-9648

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EP - 395

JO - Advanced Materials

JF - Advanced Materials

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ER -

Plasma enhanced chemical vapor deposition of vanadium carbide VC_1−x and VO_x from vanadocene Cp₂V

Abstract

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