Photoreflectance studies of N- and Ga-face AlGaN/GaN heterostructures confining a polarisation induced 2DEG

A. T. Winzer, R. Goldhahn, C. Buchheim, O. Ambacher, A. Link, M. Stutzmann, Y. Smorchkova, U. K. Mishra, J. S. Speck

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Photoreflectance measurements have been carried out in order to determine the electric field strength F within the topmost layers of Ga-face polarity AlxGa1-x/GaN and N-face polarity GaN/AlxGa 1-x/GaN heterostructures containing high-mobile polarisation induced 2DEGs. For both types of samples F decreased from 400 kV/cm at room temperature up to 200 kV/cm when cooling down the structure to T = 5 K. Our results strongly emphasise the existence of surface donor and surface acceptor states of the Ga- and N-face samples, respectively. The temperature dependence of F is explained by the change of the piezoelectric and spontaneous polarization. From self-consistent conduction band calculations the bare surface potential was obtained.

Original languageEnglish
Pages (from-to)380-383
Number of pages4
JournalPhysica Status Solidi (B) Basic Research
Volume240
Issue number2
DOIs
StatePublished - Nov 2003

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