Abstract
Ion implantation is a promising technique for surface modification, with the purpose of semi-conductor doping, electrocatalysis, improvement of corrosion resistance and change of crystallinity. In corrosion research most implantation experiments are carried out with bare metals. Here, the influence of doping a preexisting passive film on the electrochemical behavior was studied.
| Original language | English |
|---|---|
| Pages (from-to) | 39-40 |
| Number of pages | 2 |
| Journal | Electrochemical Society Extended Abstracts |
| Volume | 85-1 |
| State | Published - 1985 |
| Externally published | Yes |