Abstract
Investigations into the kinetics and mechanism of the thermal decomposition of the novel organometallic precursor 1,3-di-tert-butyl-1,3,2-diazagarmolidin-2-ylidine are reported. On the basis of these results, thin films of surprisingly pure amorphous germanium were deposited at temperatures between about 140 and 440°C. A high selectivity of the deposition on a Si surface as compared with SiO2 was obtained.
Original language | English |
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Pages (from-to) | 825-831 |
Number of pages | 7 |
Journal | Chemistry of Materials |
Volume | 8 |
Issue number | 4 |
DOIs | |
State | Published - Apr 1996 |