Abstract
A detailed study on optical and electrical properties of hydrogenated amorphous silicon-oxygen alloys prepared by rf glow discharge is presented. Changing the oxygen content from 20% to 50% allows the tuning of both the optical gap and the photoemission wavelength while keeping device quality electronic properties.
Original language | English |
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Pages (from-to) | 323-326 |
Number of pages | 4 |
Journal | Applied Surface Science |
Volume | 102 |
DOIs | |
State | Published - Aug 1996 |