Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and Their Comparison with Methyltrichlorosilane

Th Kunstmann; H. Angerer; J. Knecht; S. Veprek; N. W. Mitzel; H. Schmidbaur

doi:10.1021/cm00057a015

Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and Their Comparison with Methyltrichlorosilane

Th Kunstmann
, H. Angerer
, J. Knecht
, S. Veprek
, N. W. Mitzel
, H. Schmidbaur

Department of Chemistry

Technical University of Munich

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

Novel organometallic precursors, l,3-bis(monobromosilyl)propane, l,2-bis(monobromosilyl)- ethane, and methyltribromosilane, for low-temperature deposition of β-SiC have been developed, and the kinetics and mechanism of their decomposition investigated. On the basis of the results, heteroepitaxial thin films of β-SiC with very good structural quality have been deposited on (100) Si using methyltribromosilane and methyltrichlorosilane.

Original language	English
Pages (from-to)	1675-1679
Number of pages	5
Journal	Chemistry of Materials
Volume	7
Issue number	9
DOIs	https://doi.org/10.1021/cm00057a015
State	Published - Sep 1995

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title = "Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and Their Comparison with Methyltrichlorosilane",

abstract = "Novel organometallic precursors, l,3-bis(monobromosilyl)propane, l,2-bis(monobromosilyl)- ethane, and methyltribromosilane, for low-temperature deposition of β-SiC have been developed, and the kinetics and mechanism of their decomposition investigated. On the basis of the results, heteroepitaxial thin films of β-SiC with very good structural quality have been deposited on (100) Si using methyltribromosilane and methyltrichlorosilane.",

author = "Th Kunstmann and H. Angerer and J. Knecht and S. Veprek and Mitzel, \{N. W.\} and H. Schmidbaur",

year = "1995",

month = sep,

doi = "10.1021/cm00057a015",

language = "English",

volume = "7",

pages = "1675--1679",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

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T1 - Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and Their Comparison with Methyltrichlorosilane

AU - Kunstmann, Th

AU - Angerer, H.

AU - Knecht, J.

AU - Veprek, S.

AU - Mitzel, N. W.

AU - Schmidbaur, H.

PY - 1995/9

Y1 - 1995/9

N2 - Novel organometallic precursors, l,3-bis(monobromosilyl)propane, l,2-bis(monobromosilyl)- ethane, and methyltribromosilane, for low-temperature deposition of β-SiC have been developed, and the kinetics and mechanism of their decomposition investigated. On the basis of the results, heteroepitaxial thin films of β-SiC with very good structural quality have been deposited on (100) Si using methyltribromosilane and methyltrichlorosilane.

AB - Novel organometallic precursors, l,3-bis(monobromosilyl)propane, l,2-bis(monobromosilyl)- ethane, and methyltribromosilane, for low-temperature deposition of β-SiC have been developed, and the kinetics and mechanism of their decomposition investigated. On the basis of the results, heteroepitaxial thin films of β-SiC with very good structural quality have been deposited on (100) Si using methyltribromosilane and methyltrichlorosilane.

UR - https://www.scopus.com/pages/publications/0346022881

U2 - 10.1021/cm00057a015

DO - 10.1021/cm00057a015

M3 - Article

AN - SCOPUS:0346022881

SN - 0897-4756

VL - 7

SP - 1675

EP - 1679

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 9

ER -

Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and Their Comparison with Methyltrichlorosilane

Abstract

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