Non-specular X-ray reflection from sputtered Ni3Al/Ni multilayers

S. Tixier; P. Böni; H. Van Swygenhoven

doi:10.1016/S0921-4526(98)00198-7

Non-specular X-ray reflection from sputtered Ni₃Al/Ni multilayers

S. Tixier, P. Böni, H. Van Swygenhoven

Paul Scherrer Institut

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Ni₃Al/Ni multilayers were grown by magnetron sputtering at room temperature. Non-specular X-ray reflection (NSXR) as well as grazing incidence diffraction (GID) measurements were performed in order to study the influence of the bilayer thickness Λ and of the sputtering Ar pressure on the lateral grain size g_ℓ and on the lateral correlation length of the interfacial roughness ξ. At low Ar pressure, g_ℓ and ξ are found to be of the same order of magnitude and to scale with Λ. At high Ar pressure the two lengths diverge due to the increase of the mosaic distribution of the growing grains.

Original language	English
Pages (from-to)	31-33
Number of pages	3
Journal	Physica B: Condensed Matter
Volume	248
Issue number	1-4
DOIs	https://doi.org/10.1016/S0921-4526(98)00198-7
State	Published - 15 Jun 1998
Externally published	Yes

Keywords

Grazing incidence diffraction
Multilayers
Non-specular reflection
Roughness
Sputtering

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10.1016/S0921-4526(98)00198-7

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title = "Non-specular X-ray reflection from sputtered Ni3Al/Ni multilayers",

abstract = "Ni3Al/Ni multilayers were grown by magnetron sputtering at room temperature. Non-specular X-ray reflection (NSXR) as well as grazing incidence diffraction (GID) measurements were performed in order to study the influence of the bilayer thickness Λ and of the sputtering Ar pressure on the lateral grain size gℓ and on the lateral correlation length of the interfacial roughness ξ. At low Ar pressure, gℓ and ξ are found to be of the same order of magnitude and to scale with Λ. At high Ar pressure the two lengths diverge due to the increase of the mosaic distribution of the growing grains.",

keywords = "Grazing incidence diffraction, Multilayers, Non-specular reflection, Roughness, Sputtering",

author = "S. Tixier and P. B{\"o}ni and {Van Swygenhoven}, H.",

note = "Funding Information: We would like to thank M. Horisberger for the sample preparation, M. Bessi{\`e}re at LURE for providing beamtime and the Swiss National Science Foundation for supporting this work.",

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doi = "10.1016/S0921-4526(98)00198-7",

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T1 - Non-specular X-ray reflection from sputtered Ni3Al/Ni multilayers

AU - Tixier, S.

AU - Böni, P.

AU - Van Swygenhoven, H.

N1 - Funding Information: We would like to thank M. Horisberger for the sample preparation, M. Bessière at LURE for providing beamtime and the Swiss National Science Foundation for supporting this work.

PY - 1998/6/15

Y1 - 1998/6/15

N2 - Ni3Al/Ni multilayers were grown by magnetron sputtering at room temperature. Non-specular X-ray reflection (NSXR) as well as grazing incidence diffraction (GID) measurements were performed in order to study the influence of the bilayer thickness Λ and of the sputtering Ar pressure on the lateral grain size gℓ and on the lateral correlation length of the interfacial roughness ξ. At low Ar pressure, gℓ and ξ are found to be of the same order of magnitude and to scale with Λ. At high Ar pressure the two lengths diverge due to the increase of the mosaic distribution of the growing grains.

AB - Ni3Al/Ni multilayers were grown by magnetron sputtering at room temperature. Non-specular X-ray reflection (NSXR) as well as grazing incidence diffraction (GID) measurements were performed in order to study the influence of the bilayer thickness Λ and of the sputtering Ar pressure on the lateral grain size gℓ and on the lateral correlation length of the interfacial roughness ξ. At low Ar pressure, gℓ and ξ are found to be of the same order of magnitude and to scale with Λ. At high Ar pressure the two lengths diverge due to the increase of the mosaic distribution of the growing grains.

KW - Grazing incidence diffraction

KW - Multilayers

KW - Non-specular reflection

KW - Roughness

KW - Sputtering

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U2 - 10.1016/S0921-4526(98)00198-7

DO - 10.1016/S0921-4526(98)00198-7

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JO - Physica B: Condensed Matter

JF - Physica B: Condensed Matter

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ER -

Non-specular X-ray reflection from sputtered Ni₃Al/Ni multilayers

Abstract

Keywords

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