Non-aqueous routes to metal oxide thin films by atomic layer deposition

Erwan Rauwel, Guylhaine Clavel, Marc Georg Willinger, Protima Rauwel, Nicola Pinna

Research output: Contribution to journalArticlepeer-review

54 Scopus citations

Abstract

(Figure Presented) Controlled growth: A non-aqueous approach inspired from sol-gel chemistry and adapted to the formation of metal oxide thin films by means of atomic layer deposition is presented. The process is based on the reaction of a carboxylic acid with an alkoxide. Growth of metal oxides is achieved at temperatures as low as 50°C on various supports including carbon nanotubes (see TEM picture). The as-grown films show excellent uniformity and possess good dielectric properties.

Original languageEnglish
Pages (from-to)3592-3595
Number of pages4
JournalAngewandte Chemie International Edition in English
Volume47
Issue number19
DOIs
StatePublished - 28 Apr 2008
Externally publishedYes

Keywords

  • Atomic layer deposition
  • Metal oxides
  • Nanostructures
  • Sol-gel processes
  • Thin films

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