Non-aqueous routes to metal oxide thin films by atomic layer deposition

Erwan Rauwel; Guylhaine Clavel; Marc Georg Willinger; Protima Rauwel; Nicola Pinna

doi:10.1002/anie.200705550

Non-aqueous routes to metal oxide thin films by atomic layer deposition

Erwan Rauwel, Guylhaine Clavel, Marc Georg Willinger, Protima Rauwel, Nicola Pinna

Research output: Contribution to journal › Article › peer-review

55 Scopus citations

Abstract

(Figure Presented) Controlled growth: A non-aqueous approach inspired from sol-gel chemistry and adapted to the formation of metal oxide thin films by means of atomic layer deposition is presented. The process is based on the reaction of a carboxylic acid with an alkoxide. Growth of metal oxides is achieved at temperatures as low as 50°C on various supports including carbon nanotubes (see TEM picture). The as-grown films show excellent uniformity and possess good dielectric properties.

Original language	English
Pages (from-to)	3592-3595
Number of pages	4
Journal	Angewandte Chemie International Edition in English
Volume	47
Issue number	19
DOIs	https://doi.org/10.1002/anie.200705550
State	Published - 28 Apr 2008
Externally published	Yes

Keywords

Atomic layer deposition
Metal oxides
Nanostructures
Sol-gel processes
Thin films

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@article{efa3048b5bbe47b5ba62c03c2cc47d97,

title = "Non-aqueous routes to metal oxide thin films by atomic layer deposition",

abstract = "(Figure Presented) Controlled growth: A non-aqueous approach inspired from sol-gel chemistry and adapted to the formation of metal oxide thin films by means of atomic layer deposition is presented. The process is based on the reaction of a carboxylic acid with an alkoxide. Growth of metal oxides is achieved at temperatures as low as 50°C on various supports including carbon nanotubes (see TEM picture). The as-grown films show excellent uniformity and possess good dielectric properties.",

keywords = "Atomic layer deposition, Metal oxides, Nanostructures, Sol-gel processes, Thin films",

author = "Erwan Rauwel and Guylhaine Clavel and Willinger, {Marc Georg} and Protima Rauwel and Nicola Pinna",

year = "2008",

month = apr,

day = "28",

doi = "10.1002/anie.200705550",

language = "English",

volume = "47",

pages = "3592--3595",

journal = "Angewandte Chemie International Edition in English",

issn = "1433-7851",

publisher = "John Wiley and Sons Ltd",

number = "19",

}

TY - JOUR

T1 - Non-aqueous routes to metal oxide thin films by atomic layer deposition

AU - Rauwel, Erwan

AU - Clavel, Guylhaine

AU - Willinger, Marc Georg

AU - Rauwel, Protima

AU - Pinna, Nicola

PY - 2008/4/28

Y1 - 2008/4/28

N2 - (Figure Presented) Controlled growth: A non-aqueous approach inspired from sol-gel chemistry and adapted to the formation of metal oxide thin films by means of atomic layer deposition is presented. The process is based on the reaction of a carboxylic acid with an alkoxide. Growth of metal oxides is achieved at temperatures as low as 50°C on various supports including carbon nanotubes (see TEM picture). The as-grown films show excellent uniformity and possess good dielectric properties.

AB - (Figure Presented) Controlled growth: A non-aqueous approach inspired from sol-gel chemistry and adapted to the formation of metal oxide thin films by means of atomic layer deposition is presented. The process is based on the reaction of a carboxylic acid with an alkoxide. Growth of metal oxides is achieved at temperatures as low as 50°C on various supports including carbon nanotubes (see TEM picture). The as-grown films show excellent uniformity and possess good dielectric properties.

KW - Atomic layer deposition

KW - Metal oxides

KW - Nanostructures

KW - Sol-gel processes

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=51049088249&partnerID=8YFLogxK

U2 - 10.1002/anie.200705550

DO - 10.1002/anie.200705550

M3 - Article

AN - SCOPUS:51049088249

SN - 1433-7851

VL - 47

SP - 3592

EP - 3595

JO - Angewandte Chemie International Edition in English

JF - Angewandte Chemie International Edition in English

IS - 19

ER -

Non-aqueous routes to metal oxide thin films by atomic layer deposition

Abstract

Keywords

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