Nanostructured Ni3Al produced by magnetron sputtering

H. Van Swygenhoven, P. Böni, F. Paschoud, M. Victoria, M. Knauss

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

Intermetallic Ni3Al has been deposited by means of magnetron sputtering on substrates with an amorphous surface structure. The source was a homogeneous mixture of NiAl 75:25 % in the solid phase. The lateral and perpendicular grain sizes are below 20 nm. The morphology of the layer was studied by transmission electron microscopy. The hardness of a single Ni3Al layer and of a multilayered Ni3AllNi are measured by nanoindentation and compared with the hardness of a bulk coarse-grained polycrystalline Ni3Al.

Original languageEnglish
Pages (from-to)739-742
Number of pages4
JournalNanostructured Materials
Volume6
Issue number5-8
DOIs
StatePublished - 1995
Externally publishedYes

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