Abstract
The present investigation is devoted to the X-ray photoelectron spectroscopy (XPS) analysis of the main core levels (C 1s, O 1s, Dy 4d, Dy 3d) of a representative dysprosium(III) oxide thin film. The specimen was grown on Si(100) at 500 °C by metal organic chemical vapor deposition (MOCVD) starting from Dy((iPrN)2CNMe2)3 in an N2/O2 atmosphere. The above route yielded uniform and homogeneous nanostructured Dy2O3 films characterized by a remarkable reactivity towards atmospheric CO2 and H2O, resulting in the surface co-presence of dysprosium carbonates/bicarbonates and hydroxides. The most relevant spectral features are presented and discussed.
Original language | English |
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Article number | SSSPEN000014000001000052000001 |
Pages (from-to) | 52-59 |
Number of pages | 8 |
Journal | Surface Science Spectra |
Volume | 14 |
Issue number | 1-4 |
DOIs | |
State | Published - 2007 |
Externally published | Yes |
Keywords
- DyO
- High-k
- MOCVD
- Nanosystems
- X-ray photoelectron spectroscopy