Nanoscale patterning at the Si/SiO₂/graphene interface by focused He⁺ beam

Keyphrases

• Si-SiO2 100%
• Ion Dose 100%
• Graphene Interface 100%
• Nanopatterning 100%
• High Dose 50%
• He Ions 50%
• Focused Ion Beam Patterning 50%
• Defect Array 50%
• Carbon Atom 25%
• Dielectric Constant 25%
• Spectroscopic Measurement 25%
• Surface Morphology 25%
• Surface Zone 25%
• Graphene 25%
• Amorphization 25%
• Layer Formation 25%
• Patterned Surface 25%
• Silicon Oxycarbide (SiOC) 25%
• Local Height 25%
• Heterogeneous Catalysis 25%
• Symmetry Results 25%
• Subsurface Layer 25%
• Blister 25%
• Cylindrical Symmetry 25%
• Damage Zone 25%
• Optical Micrograph 25%
• Helium Nanobubbles 25%
• 2D Lattice 25%
• Raman Modes 25%
• Photoionization Spectroscopy 25%
• Pattern Defect 25%
• Atomic Force Microscopy Imaging 25%
• Bond Rearrangement 25%
• Graphene Monolayer 25%
• Transition Metal Nanoparticles 25%
• Graphene Network 25%
• Micro-Raman Imaging 25%
• Raman Imaging 25%
• Moderatio 25%
• Patterned Materials 25%
• Multicomponent Materials 25%

Material Science

• Graphene 100%
• Focused Ion Beam 40%
• Surface (Surface Science) 40%
• Permittivity 20%
• Amorphization 20%
• Atomic Force Microscopy 20%
• Transition Metal 20%
• Monolayers 20%
• Oxidation Reaction 20%
• Surface Morphology 20%
• Silicon Oxycarbide 20%
• Heterogeneous Catalysis 20%
• Metal Nanoparticle 20%